SEM is a conductive sample surface microrelief analysis method. It is based on the detection of the secondary electrons generated by a keV-energy focused electron beam. Ultimate resolution is down to couple of nanometers.

It is a method of conductive sample surface microrelief study based on the detection of secondary electrons generated by the gallium ion beam. Ultimate resolution of this microscopy type is down to several nanometers.

SIMS is a method based on the analysis of secondary ions masses generated during the sample milling by gallium focused ion beam. Ion masses are detected by quadruple mass-spectrometer with mass resolution down to 1 a.e.m.

It is the method of samples electrophysical parameters study based on Hall effect measurements.

Ion beam lithography is a method of sample surface nanopatterning by focused ion beam milling with gallium ion beam. Minimal size of milled element is down to tenths of nanometers.

This is a method of a sample surface nanopatterning based on the etching through polymer mask. Mask is made by rastered focused electron beam irradiation of the PMMA coating. Ultimate object size is several tenths of nanometers.

It is a method based on the etching of the sample through polymer mask. Mask is made by laser beam irradiation (wavelength 405 nm) of polymer coating. Minimal object size is 3 mkm.

Sample sputtering by argon ion beam through pre-defined mask.

Sample surface treatment by argon or oxygen plasma leading to the organic contamination removal and surface hydrophilic properties enhancement.

Thin metals (aluminum, copper, gold) coatings creation by thermal sputtering in vacuum.